Symposium R1

Next-Generation Nanoimprint Lithography: Products and Applications

This symposium on advances in nanoimprint lithography (NIL) is focused on imprint-enabled nanomanufacturing processes, technologies and products, and is structured to accommodate both academia and industry players. The NIL market has gained significant traction in both semiconductor and non-semiconductor domains such as optics, photonics, advanced flat panel display, sensors, flexible electronics and MedTech. This symposium brings together eminent academicians, scientists, engineers and industry partners from all around the globe to share and discuss the nanoimprint ecosystem in their respective places of operation and recent advancement in this multi-disciplinary field. It also covers topics on imprint materials development, process development, device integration, defect inspection and new product introduction.

Topics of interest include but are not limited to:

  • Novel resists and imprint materials development
  • Nanoimprint-enabled diffractive and refractive optics
  • Next-generation photonics devices, MedTech devices, sensors
  • Nanoimprint for flexible electronics, hybrid electronics, wearables
  • Roadmap and technology gaps in the nanoimprint platform


Yee Chong Loke
Institute of Materials Research & Engineering, A*STAR, Singapore


Vignesh Suresh
WearOptimo, Australia

Jay Guo
University of Michigan, USA

Fei Duan
Nanyang Technological University, Singapore


Yee Chong Loke
Institute of Materials Research & Engineering, A*STAR, Singapore

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